Materials and Processes for Complex Microsystems on Silicon

Prof. T. Venkatesan’s research focuses on advancing microsystem technologies (MEMs, microbots, and opto-electronics) by integrating functional materials onto silicon using Pulsed Laser Deposition (PLD). This method is gaining traction in the semiconductor industry for its ability to grow crystalline materials on silicon, enabling applications in quantum information systems, opto-electronics, and heterogeneous integration.

Key challenges in optical qubits, such as decoherence, scalability, and precise qubit placement, are being addressed through the development of CeO₂-based layers with a layer-by-layer growth and doping process. His team has also created a buffer layer scheme to support the growth of various crystalline oxides on silicon.

A major innovation is PLATEN (Pulsed Laser Template Engineering), which allows oxides to conform to pre-patterned silicon wafers, eliminating the need for difficult etching processes. By leveraging well-established reactive ion etching of silicon, this approach simplifies the fabrication of opto-electronic devices.

Additionally, he will be exploring oxide heterostructures to introduce new functionalities, including the recent discovery of ferroelectricity in unexpected material combinations. His work has also led to the commercialization of several technologies derived from this research.